The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

May. 07, 2014
Applicant:

Halliburton Energy Services, Inc., Houston, TX (US);

Inventors:

Philip D. Nguyen, Houston, TX (US);

Loan K. Vo, Houston, TX (US);

Jessica L. Heeter, Houston, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21B 43/26 (2006.01); C09K 8/72 (2006.01); C09K 8/80 (2006.01); E21B 33/138 (2006.01); E21B 43/25 (2006.01); E21B 43/267 (2006.01);
U.S. Cl.
CPC ...
C09K 8/72 (2013.01); C09K 8/805 (2013.01); E21B 33/138 (2013.01); E21B 43/25 (2013.01); E21B 43/26 (2013.01); E21B 43/267 (2013.01); C09K 2208/08 (2013.01); C09K 2208/24 (2013.01); C09K 2208/26 (2013.01); C09K 2208/32 (2013.01);
Abstract

Various embodiments disclosed relate to methods of acidizing subterranean formations and systems for performing the method. In various embodiments, the present invention provides a method of acidizing a subterranean formation including placing an acid-resisting treatment composition including a surface modification agent in a subterranean formation, such that part of the subterranean formation includes an at least partially acid-resistant coating including the acid-resisting treatment composition or a reaction product thereof. The method also includes placing an acidizing composition in the subterranean formation, wherein the acidizing composition at least one of etches and dissolves a part of the subterranean formation substantially free of the acid-resistant coating.


Find Patent Forward Citations

Loading…