The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

May. 16, 2018
Applicant:

Arkema France, Colombes, FR;

Inventors:

Julien Jouanneau, Corneville sur Risle, FR;

Guillaume Le, Herouville Saint Clair, FR;

Guillaume Vincent, Caen, FR;

Assignee:

ARKEMA FRANCE, Colombes, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 45/46 (2006.01); C08G 61/12 (2006.01); C08G 65/40 (2006.01);
U.S. Cl.
CPC ...
C07C 45/46 (2013.01); C08G 61/127 (2013.01); C08G 65/4012 (2013.01); C08G 2261/3442 (2013.01); C08G 2261/45 (2013.01); C08G 2650/62 (2013.01);
Abstract

A method for manufacturing 1,4-bis(4-phenoxybenzoylbenzene), including: providing a reactant mixture including terephthaloyl chloride, diphenyl ether and a Lewis acid in a solvent; reacting terephthaloyl chloride with diphenyl ether, so as to obtain a product mixture including a 1,4-bis(4-phenoxybenzoylbenzene)-Lewis acid complex; wherein the 1,4-bis(4-phenoxybenzoylbenzene)-Lewis acid complex is dissolved in the solvent at a 1,4-bis(4-phenoxybenzoylbenzene) weight concentration in the solvent which is higher than the saturation limit of the 1,4-bis(4-phenoxybenzoylbenzene)-Lewis acid complex during at least part of the step of reacting terephthaloyl chloride with diphenyl ether.


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