The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Sep. 16, 2016
Applicant:

Korea Institute of Energy Research, Daejeon, KR;

Inventors:

Namjo Jeong, Daejeon, KR;

Chan-Soo Kim, Jeju, KR;

Ji Yeon Choi, Seoul, KR;

Joo-youn Nam, Jeju, KR;

Soon-chul Park, Jeju, KR;

Moon seok Jang, Daejeon, KR;

Kangmin Chon, Busan, KR;

Ji-Hyung Han, Jeju, KR;

Han-Ki Kim, Jeju, KR;

Eun-Jin Jwa, Jeju, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B 35/00 (2006.01); C04B 35/628 (2006.01); B22F 1/00 (2006.01); C01B 33/02 (2006.01); C01B 32/05 (2017.01);
U.S. Cl.
CPC ...
C04B 35/62839 (2013.01); B22F 1/00 (2013.01); C01B 32/05 (2017.08); C01B 33/02 (2013.01); C04B 35/62884 (2013.01); C04B 35/62886 (2013.01); C04B 2235/52 (2013.01);
Abstract

A method includes: supplying sources or nanoparticles of any one or two or more combinations selected from a group which consists of a carbon source, a doping source, a doped element containing carbon source, and a waste plastic source into a high-temperature and high-pressure closed autoclave, completely closing the high-temperature and high-pressure closed autoclave, and forming a nanoparticle-carbon core-shell structure by a single process by coating a carbon layer on the surface of the nanoparticles or forming a core-shell structure of nanoparticle-doped carbon by the single process by coating a carbon layer doped with the doped element on the surface of the nanoparticles under pressure self-generated in the autoclave and a reaction temperature in the range of 500 to 850° C. by heating the autoclave.


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