The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Jan. 27, 2017
Applicant:

Plant Advanced Technologies Pat, Vandoeuvre-les-Nancy, FR;

Inventors:

Paul Hannewald, Vandoeuvre-les-Nancy, FR;

Frédéric Bourgaud, Vandoeuvre-les-Nancy, FR;

Benoît Mignard, Toulouse, FR;

Damien Boeglin, Vandoeuvre-les-Nancy, FR;

Assignee:

PLANT ADVANCED TECHNOLOGIES PAT, Vandoeuvre-les-Nancy, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 8/37 (2006.01); A61Q 19/08 (2006.01); A61K 8/97 (2017.01); A61K 36/39 (2006.01); C07C 39/17 (2006.01); C07C 69/757 (2006.01); A61K 8/9783 (2017.01); A61K 8/39 (2006.01);
U.S. Cl.
CPC ...
A61K 8/375 (2013.01); A61K 8/39 (2013.01); A61K 8/97 (2013.01); A61K 8/9783 (2017.08); A61K 36/39 (2013.01); A61Q 19/08 (2013.01); C07C 39/17 (2013.01); C07C 69/757 (2013.01); A61K 2236/00 (2013.01); C07C 2601/14 (2017.05);
Abstract

Disclosed are glycol esters of dicaffeoylquinic acids, in particular dipropylene glycol esters of dicaffeoylquinic acids (DPG esters of DCQ) and propane-1.3-diol esters of dicaffeoylquinic acids of general formula: wherein Ris a dipropylene glycol radical or a propane 1,3 diol radical, and any two of the radicals R, R, Rand Rare a caffeoyl group, the other two being a hydrogen atom. Also disclosed is a plant extract including same, the method for preparing same and a cosmetic composition including the compounds or extracts, intended for preventing or delaying the appearance of skin ageing effects.


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