The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2019
Filed:
Feb. 17, 2017
Applicant:
Under Armour, Inc., Baltimore, MD (US);
Inventors:
Alan Guyan, Baltimore, MD (US);
David McManus, Portland, OR (US);
John Acevedo, Portland, OR (US);
Alan Toronjo, Portland, OR (US);
Assignee:
Under Armour, Inc., Baltimore, MD (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/26 (2006.01); A43B 23/02 (2006.01); A45F 3/12 (2006.01); A45F 3/04 (2006.01); A45F 3/00 (2006.01);
U.S. Cl.
CPC ...
A43B 23/027 (2013.01); A43B 23/026 (2013.01); A43B 23/028 (2013.01); A43B 23/0215 (2013.01); A43B 23/0245 (2013.01); A45F 3/12 (2013.01); A45F 3/04 (2013.01); A45F 2003/001 (2013.01); Y10T 428/24273 (2015.01);
Abstract
An article of apparel includes a base layer and an auxetic layer coupled to the base layer. The auxetic layer includes an auxetic structure defining a repeating pattern of shapes, with each of the shapes defined by perimeter walls and an interior recess. The auxetic layer includes a first region and a second region. Each interior recess in the first region provides a void exposing the base layer, and each interior recess in the second region is at least partially filled with a recess material.