The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2019

Filed:

Aug. 26, 2016
Applicant:

Goji Limited, Hamilton, BM;

Inventors:

Pinchas Einziger, Haifa, IL;

Eran Ben-Shmuel, Savyon, IL;

Alexander Bilchinsky, Monosson-Yahud, IL;

Amit Rappel, Ofra, IL;

Denis Dikarov, Hod Hasharon, IL;

Michael Sigalov, Beer-Sheva, IL;

Yoel Biberman, Haifa, IL;

Assignee:

GOJI LIMITED, Hamilton, BM;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 6/64 (2006.01); H05B 6/70 (2006.01); H05B 6/68 (2006.01); G01S 13/89 (2006.01); B01J 19/12 (2006.01); H05B 6/72 (2006.01); F26B 3/347 (2006.01);
U.S. Cl.
CPC ...
H05B 6/68 (2013.01); B01J 19/126 (2013.01); B01J 19/129 (2013.01); F26B 3/347 (2013.01); G01S 13/89 (2013.01); H05B 6/64 (2013.01); H05B 6/6447 (2013.01); H05B 6/686 (2013.01); H05B 6/70 (2013.01); H05B 6/705 (2013.01); H05B 6/72 (2013.01); B01J 2219/0871 (2013.01); B01J 2219/1203 (2013.01); B01J 2219/1206 (2013.01); Y02B 40/143 (2013.01); Y02B 40/146 (2013.01);
Abstract

An apparatus is provided for applying electromagnetic energy at a frequency or frequencies in a frequency range of 1 MHz to 100 GHz to an object in a cavity via at least one radiating element. At least one processor is configured to receive a target energy distribution, select, based on the target energy distribution, a plurality of sets of values of field-affecting parameters controllable by the apparatus. The parameters include at least one of frequency, phase, and amplitude. The apparatus provides for the control of a source coupled to the at least one radiating element to excite a respective field pattern for each selected set of values.


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