The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2019

Filed:

Jul. 24, 2017
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Alexander Philippou, Munich, DE;

Erich Griebl, Dorfen, DE;

Johannes Georg Laven, Taufkirchen, DE;

Maria Cotorogea, Taufkirchen, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/58 (2006.01); H01L 21/66 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 21/786 (2006.01); H01L 29/417 (2006.01); H01L 21/8234 (2006.01); G01R 31/02 (2006.01); G01R 31/26 (2014.01); H01L 23/522 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/407 (2013.01); G01R 31/025 (2013.01); G01R 31/2644 (2013.01); H01L 21/786 (2013.01); H01L 21/823418 (2013.01); H01L 21/823475 (2013.01); H01L 22/14 (2013.01); H01L 22/32 (2013.01); H01L 22/34 (2013.01); H01L 23/5221 (2013.01); H01L 29/41766 (2013.01); H01L 29/66727 (2013.01); H01L 29/7397 (2013.01); H01L 29/7813 (2013.01); H01L 2224/4813 (2013.01);
Abstract

A semiconductor device includes a first source wiring substructure connected to a plurality of source doping region portions of a transistor structure, and a second source wiring substructure connected to a plurality of source field electrodes located in a plurality of source field trenches extending into a semiconductor substrate. A contact wiring portion of the first source wiring substructure and a contact wiring portion of the second source wiring substructure are located in a wiring layer of a layer stack located on the semiconductor substrate. The contact wiring portion of the first source wiring substructure and the contact wiring portion of the second source wiring substructure each have a lateral size sufficient for a contact for at least a temporary test measurement. The wiring layer including the contact wiring portions is located closer to the substrate than any ohmic electrical connection between the first and the second source wiring substructures.


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