The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2019

Filed:

May. 02, 2016
Applicant:

Battelle Memorial Institute, Richland, WA (US);

Inventors:

Yehia M. Ibrahim, Richland, WA (US);

Sandilya V. B. Garimella, Richland, WA (US);

Richard D. Smith, Richland, WA (US);

Assignee:

Battelle Memorial Institute, Richland, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/26 (2006.01); H01J 49/02 (2006.01); H01J 49/00 (2006.01); H01J 49/40 (2006.01); G01N 27/62 (2006.01);
U.S. Cl.
CPC ...
H01J 49/26 (2013.01); G01N 27/622 (2013.01); H01J 49/0013 (2013.01); H01J 49/022 (2013.01); H01J 49/40 (2013.01);
Abstract

Methods and devices for ion separations or manipulations in gas phase are disclosed. The device includes a non-planar surface having a first, second and third region. An inner arrays of electrodes is positioned on the first region. A first set of electrodes of the inner array of electrodes is configured to receive RF voltages and generate a first potential upon the receipt of the RF voltage. A first and second outer arrays of electrodes are coupled to the second and third region, respectively. The first and second outer arrays are configured to receive a first DC voltage and generate a second potential upon the receipt of the first DC voltages. The first and second generated potential manipulate movement of ions.


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