The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Mar. 12, 2014
Honeywell International Inc., Morris Plains, NJ (US);
Xiaoli Wang, Beijing, CN;
Henry Chen, Beijing, CN;
Yi Sun, Beijing, CN;
Paul Derby, Lubbock, TX (US);
Hari Thiruvengada, Plymouth, MN (US);
Honeywell International Inc., Morris Plains, NJ (US);
Abstract
Apparatus and associated methods relate to fitting a virtual mask to a virtual face by first fitting a chin region of the virtual mask to the virtual face, then determining an virtual mask angle that maintains the fitted chin region while simultaneously fitting a nose-bridge region of the virtual mask to the virtual face, and then calculating a fit-quality metric corresponding to the fitted position. In an illustrative embodiment, the fitted chin region may include the high curvature menton region of the chin. In some examples, a virtual mask may be virtually pressed toward the virtual face using a predetermined force corresponding to a force of a mask securing device of a real mask corresponding to the virtual mask In an exemplary embodiment, the fitting of a virtual mask to a virtual face may advantageously yield a mask's fit quality in a brief amount of time.