The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Sep. 16, 2016
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Masahiko Akiyama, Ota, JP;
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Abstract
According to one embodiment, a pattern forming method is disclosed. The method includes preparing a processed body including a substrate having a first face, a first layer provided on the first face, a second layer provided on the first layer, and a photosensitive lyophilic/lyophobic original material provided on the second layer. The method includes performing a first process of irradiating light onto one of a first portion at a first position of the material and a second portion at a second position of the material, and making a first contact angle of a liquid with a first region of an upper face of the processed body relatively larger than a second contact angle of the liquid with a second region of the upper face. The method includes performing a first pattern forming process of forming a first pattern by bringing the liquid into contact with the second region.