The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Nov. 14, 2016
Beam Engineering for Advanced Measurements Co., Orlando, FL (US);
David E. Roberts, Apopka, FL (US);
Nelson V. Tabirian, Winter Park, FL (US);
Beam Engineering for Advanced Measurements Co., Orlando, FL (US);
Abstract
Optical beam shaping systems and methods can include an illumination source and a diffractive waveplate diffuser. The diffractive waveplate diffuser includes a layer of patterned optically anisotropic material. In one embodiment, the layer of patterned optically anisotropic material is fabricated in the form of patterned, optically anisotropic liquid crystal polymer. In another embodiment, the layer of patterned optically anisotropic material is a layer of liquid crystal, the diffractive waveplate diffuser also includes two alignment layers and two transparent conductive coatings, and the properties of the liquid crystal layer are controlled by the application of an electric potential between the two transparent conductive coatings. A method is provided for designing the alignment pattern of the layer of optically anisotropic material.