The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Nov. 20, 2015
Applicant:
Korea Institute of Machinery & Materials, Daejeon, KR;
Inventors:
Dong Ho Kim, Gyeongsangnam-do, KR;
Sung Gyu Park, Gyeongsangnam-do, KR;
Chang Su Kim, Gyeongsangnam-do, KR;
Assignee:
KOREA INSTITUTE OF MACHINERY & MATERIALS, Daejeon, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B82Y 15/00 (2011.01); G01N 21/65 (2006.01); B82Y 30/00 (2011.01); B82Y 20/00 (2011.01);
U.S. Cl.
CPC ...
G01N 21/658 (2013.01); B82Y 15/00 (2013.01); B82Y 20/00 (2013.01); B82Y 30/00 (2013.01);
Abstract
The present disclosure relates to a substrate for surface enhanced Raman scattering, a fabricating method for the same and an analyzing method using the same. The present disclosure may provide a substrate for surface enhanced Raman scattering having excellent surface enhanced Raman scattering effects by randomly stacking of Ag nanowires in a simple way by utilizing a substrate having a filtering function, and a method for efficiently analyzing a material to be analyzed using the same.