The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Dec. 30, 2016
Applicant:
Nitta Haas Incorporated, Osaka, JP;
Inventor:
Rika Tanaka, Kyoto, JP;
Assignee:
NITTA HAAS INCORPORATED, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); C09G 1/02 (2006.01); H01L 21/3105 (2006.01); H01L 21/321 (2006.01); C09K 3/14 (2006.01); C23F 3/00 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09K 3/1409 (2013.01); C23F 3/00 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01);
Abstract
A composition for polishing silicon nitride according to the present invention includes colloidal silica, a polishing aid including a phosphoric acid compound and a sulfuric acid compound. By further including an oxidizing agent, a first selectivity representing the ratio of a polishing speed for a metal layer to a polishing speed for a silicon nitride layer and a second selectivity representing the ratio of a polishing speed for an oxide insulating layer to a polishing speed for a silicon nitride are controlled.