The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Jan. 16, 2015
Applicant:
Brewer Science Inc., Rolla, MO (US);
Inventors:
Assignee:
Brewer Science, Inc., Rolla, MO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 153/00 (2006.01); C08F 293/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C09D 153/00 (2013.01); C08F 293/005 (2013.01); G03F 7/0002 (2013.01); C08F 2438/03 (2013.01); Y10T 428/24802 (2015.01); Y10T 428/3154 (2015.04);
Abstract
Compositions for directed self-assembly (DSA) patterning techniques are provided. Methods for directed self-assembly are also provided in which a DSA composition comprising a block copolymer (BCP) is applied to a substrate and then self-assembled to form the desired pattern. The block copolymer includes at least two blocks and is selected to have a high interaction parameter (χ). The BCPs are able to form perpendicular lamellae by simple thermal annealing on a neutralized substrate, without a top coat. The BCPs are also capable of micro-phase separating into lines and spaces measuring at 10 nm or smaller, with sub-20-nm Lcapability.