The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Mar. 04, 2014
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Kenji Kitagawa, Tokyo, JP;
Toshiki Ito, Kawasaki, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K 5/435 (2006.01); C07C 311/17 (2006.01); C08F 2/48 (2006.01); G03F 7/00 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); B29C 35/08 (2006.01); B29C 59/00 (2006.01); B29C 59/02 (2006.01); B29D 11/00 (2006.01); C07C 311/44 (2006.01); G03F 7/004 (2006.01); B29K 33/00 (2006.01); B29L 31/34 (2006.01);
U.S. Cl.
CPC ...
C08K 5/435 (2013.01); B29C 35/0805 (2013.01); B29C 59/005 (2013.01); B29C 59/026 (2013.01); B29D 11/00865 (2013.01); C07C 311/17 (2013.01); C07C 311/44 (2013.01); C08F 2/48 (2013.01); G03F 7/0002 (2013.01); G03F 7/0046 (2013.01); H01L 21/0274 (2013.01); H01L 21/02118 (2013.01); B29K 2033/12 (2013.01); B29L 2031/3425 (2013.01); Y10T 428/24612 (2015.01);
Abstract
A photocurable composition excellent in the effect of reducing the mold releasing force even in a small amount of light exposure, and a photosensitive gas generating agent contained in the photocurable composition are provided. The photosensitive gas generating agent is a compound having a photostimulation responsive gas generating group to generate a gas by photostimulation, a perfluoroalkyl group and a polyalkyleneoxy group to link the photostimulation responsive gas generating group and the perfluoroalkyl group. The photocurable composition contains the photosensitive gas generating agent.