The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Nov. 26, 2015
Centre National DE LA Recherche Scientifique (Cnrs), Paris, FR;
Universite D'orleans, Orleans, FR;
Inel, Artenay, FR;
Jean-Michel Pouvesle, Saint-Pryve-Saint-Mesmin, FR;
Eric Robert, Orleans, FR;
Sebastien Dozias, Saint-Jean de la Ruelle, FR;
Michel Hugnot, Orleans, FR;
Vanessa Sarron, Cesson-Sevigne, FR;
Thibault Darny, Blicourt, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), Paris, FR;
UNIVERSITE D'ORLEANS, Orleans, FR;
INEL, Artenay, FR;
Abstract
The invention relates to a method (S) for generating a plurality of cold-plasma jets at atmospheric pressure in order to treat a target (), wherein said method includes the following steps: producing (S) a primary cold-plasma jet () at atmospheric pressure using a plasma source (); placing (S) a substrate () near the target () to be treated, said substrate () including at least two through-holes; and passing (S) the plasma through the through-holes () of the substrate () such as to generate at least two secondary cold-plasma jets () at atmospheric pressure.