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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10418521 B1

PDFFull Text
Date of Patent:
Sep. 17, 2019

Filed:

Oct. 27, 2016

Method for manufacturing substrate and method for manufacturing light emitting element using same

Applicant:

Toray Industries, Inc., Tokyo, JP;

Inventors:

Hideyuki Kobayashi, Otsu, JP;

Tomoyuki Yuba, Otsu, JP;

Assignee:

TORAY INDUSTRIES, INC., , JP;

Attorney:

RatnerPrestia

Primary Examiner:

Dale E Page

Assistant Examiner:

Quovaunda Jefferson

Int. Cl.
CPC ...
H01L 33/24 (2010.01); C08G 65/18 (2006.01); C08K 5/1525 (2006.01); C08L 63/00 (2006.01); C08L 79/04 (2006.01); C08L 79/08 (2006.01); G03F 7/40 (2006.01); C08G 69/28 (2006.01); C09D 177/06 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); H01L 33/00 (2010.01); H01L 33/12 (2010.01); G03F 7/022 (2006.01); G03F 7/023 (2006.01); C08K 5/41 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
H01L 33/24 (2013.01); C08G 65/18 (2013.01); C08G 69/28 (2013.01); C08K 5/1525 (2013.01); C08L 63/00 (2013.01); C08L 79/04 (2013.01); C08L 79/08 (2013.01); C09D 177/06 (2013.01); G03F 7/0226 (2013.01); G03F 7/0233 (2013.01); G03F 7/039 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/40 (2013.01); H01L 33/0075 (2013.01); H01L 33/12 (2013.01); C08K 5/41 (2013.01); G03F 7/0755 (2013.01);
Abstract

A method of producing a patterned substrate includes the steps of: providing, on a substrate, a coating film of a resin composition including (A) an alkali-soluble resin selected from the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, polybenzoxazole precursors, copolymers of at least two of the resins, and copolymers of at least one of the resins and another structural unit, (B) a photoacid generator, and (C) at least one compound selected from the group consisting of epoxy compounds and oxetane compounds; forming a pattern of the coating film; patterning the substrate through etching using the pattern of the coating film as a mask; and removing the coating film of the resin composition.

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