The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
May. 30, 2018
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Hui Zang, Guilderland, NY (US);
Chun Yu Wong, Ballston Lake, NY (US);
Laertis Economikos, Wappingers Falls, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823481 (2013.01); H01L 21/823431 (2013.01); H01L 21/823437 (2013.01);
Abstract
Methods of forming a CT pillar with reduced width and increased distance from neighboring fins and the resulting devices are provided. Embodiments include providing a first pair of fins and a second pair of fins in an oxide layer, wherein the first and second pair of fins include Si; and forming a CT pillar including SiN between the first and second pair of fins and over a portion of the oxide layer, wherein width of the CT pillar and distance between the CT pillar and the first and second pair of fins are inversely proportional.