The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Oct. 10, 2007
Applicants:
Siegfried Krassnitzer, Feldkirch, AT;
Oliver Cstoehl, Balzers, LI;
Daniel Lewis, Grabs, CH;
Inventors:
Assignee:
OERLIKON TRADING AG, TRUEBBACH, Truebbach, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3438 (2013.01); B08B 7/0035 (2013.01); H01J 37/32568 (2013.01); H01J 37/32623 (2013.01); H01J 37/32633 (2013.01); H01J 37/34 (2013.01); H01J 37/3447 (2013.01); H01L 21/67028 (2013.01); H01L 21/67069 (2013.01); H01J 2237/335 (2013.01);
Abstract
Plasma etch-cleaning of substrates is performed by means of a plasma discharge arrangement comprising an electron source cathode () and an anode arrangement (). The anode arrangement () comprises on one hand an anode electrode () and on the other hand and electrically isolated therefrom a confinement (). The confinement () has an opening () directed towards an area (S) of a substrate () to be cleaned. The electron source cathode () and the anode electrode () are electrically supplied by a supply circuit with a supply source (). The circuit is operated electrically floating.