Apparatus for manufacturing silicon single crystal and melt inlet pipe of the same

Abstract

An apparatus for manufacturing a silicon single crystal is provided. The apparatus comprises a chamber (), a quarts crucible () provided in the chamber so as to be rotatable and movable upward and downward and store a silicon melt, a first heater () for melting a silicon raw material stored in the crucible, and a pulling mechanism () provided in the chamber so as to be rotatable and movable upward and downward. The pulling mechanism has a lower end to which a seed crystal (S) is attached. The seed crystal is to be dipped in the silicon melt in the crucible and pulled upward for growing a silicon single crystal by a Czochralski method. The apparatus further comprises a melt supplying mechanism () for supplying an additional silicon melt to the silicon melt in the crucible from external of the chamber. The melt supplying mechanism includes a melt inlet pipe () disposed at an inclination angle θ1 of 50° to 80° with respect to the melt surface of the silicon melt and a melt generating mechanism () for supplying the additional silicon melt (M) to an opening part () of a base end of the melt inlet pipe. The melt inlet pipe has a tip end provided with an opening part (). The opening part of the tip end has an annular surface inclined at an angle θwith respect to a direction orthogonal to the axis of the melt inlet pipe. The annular surface has a vertically lower side () and a vertically upper side (). The vertically lower side is located nearer to the tip end in the axis direction than the vertically upper side.