The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Jul. 30, 2012
Applicant:
Vincent Fry, Duarte, CA (US);
Inventor:
Vincent Fry, Duarte, CA (US);
Assignee:
Goodrich Corporation, Charlotte, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/04 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45578 (2013.01); C23C 16/045 (2013.01); C23C 16/45591 (2013.01); Y10T 29/49945 (2015.01);
Abstract
A gas injector system is provided that allows for improved distribution and directional control of the vapor material in a CVD or CVI process. Gas injector systems may be used without experiencing significant clogging of gas injector tube apertures over multiple CVD procedures. Further, a gas injector system provided includes a dual aperture release system and/or allow vapor material to flow both substantially horizontally and substantially vertically.
Fry, Vincent. (2019). Methods and apparatus for controlled chemical vapor deposition (U.S. Patent No. 10415138). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10415138
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile