The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2019

Filed:

Oct. 31, 2014
Applicant:

Wadeco Co., Ltd., Hyogo, JP;

Inventors:

Hayae Kayano, Hyogo, JP;

Kenji Kurose, Hyogo, JP;

Assignee:

WADECO CO., LTD., Amagasaki-Shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C21B 5/00 (2006.01); F27D 21/00 (2006.01); G01S 13/08 (2006.01); F27D 3/08 (2006.01); G01B 15/04 (2006.01); G01S 7/03 (2006.01); G01S 13/89 (2006.01); G01B 11/24 (2006.01); G01S 13/88 (2006.01); F27B 1/20 (2006.01); F27D 3/10 (2006.01); G01S 13/34 (2006.01);
U.S. Cl.
CPC ...
C21B 5/006 (2013.01); C21B 5/008 (2013.01); F27B 1/20 (2013.01); F27D 3/08 (2013.01); F27D 3/10 (2013.01); F27D 21/0028 (2013.01); G01B 11/24 (2013.01); G01B 15/04 (2013.01); G01S 7/03 (2013.01); G01S 13/08 (2013.01); G01S 13/34 (2013.01); G01S 13/882 (2013.01); G01S 13/89 (2013.01);
Abstract

A detection wave from a transmitting/receiving means is guided to the interior of a blast furnace via an antenna and a reflecting plate, and when a reflected wave from the surface of a loaded material is reflected by the reflecting plate and received by the transmitting/receiving means, the reflecting plate is rotated together with the antenna, or the reflecting plate is rotated additionally, and the surface profile of the loaded material is measured by scanning the surface of the loaded material in a linear manner or a planar manner during the turning of a chute or for each prescribed turn of the chute. A deposition profile is obtained on the basis of this surface profile and is compared to a predetermined theoretical deposition profile, and the chute is controlled so as to correct the error with respect to the theoretical deposition profile and then which new loaded material is introduced.


Find Patent Forward Citations

Kayano, Hayae. (2019). Method for loading and depositing loaded material in blast furnace, loaded material surface detection device, and method for operating blast furnace (U.S. Patent No. 10415107). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10415107

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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