The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
May. 01, 2019
Fujifilm Electronic Materials U.s.a., Inc., N. Kingstown, RI (US);
Tomonori Takahashi, Shizuoka, JP;
Bing Du, Gilbert, AZ (US);
William A. Wojtczak, Mesa, AZ (US);
Thomas Dory, Gilbert, AZ (US);
Emil A. Kneer, Mesa, AZ (US);
Fujifilm Electronic Materials U.S.A., Inc., N. Kingstown, RI (US);
Abstract
This disclosure relates to a cleaning composition that contains 1) hydroxylamine in an amount of from about 0.5% to about 20% by weight of the composition; 2) a pH adjusting agent, the pH adjusting agent being a base free of a metal ion and in an amount of at most about 3% by weight of the composition; 3) an alkylene glycol; and 4) water; in which the pH of the composition is from about 7 to about 11. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.