The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Nov. 06, 2017
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Soo Jin Kim, Seoul, KR;
Hyo Sun Lee, Daejeon, KR;
Jin Hye Bae, Suwon-si, KR;
Jung Hun Lim, Daejeon, KR;
Yong Jae Choi, Gyeongsangbuk-do, KR;
Assignees:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Soulbrain Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); H01L 21/306 (2006.01); H01L 21/3213 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/775 (2006.01); B82Y 10/00 (2011.01); H01L 29/06 (2006.01); C09K 13/00 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); B82Y 10/00 (2013.01); C09K 13/00 (2013.01); H01L 21/30604 (2013.01); H01L 21/32134 (2013.01); H01L 29/0653 (2013.01); H01L 29/0673 (2013.01); H01L 29/423 (2013.01); H01L 29/42364 (2013.01); H01L 29/66 (2013.01); H01L 29/66439 (2013.01); H01L 29/775 (2013.01); H01L 29/78 (2013.01); H01L 29/785 (2013.01); H01L 29/42392 (2013.01); H01L 29/66545 (2013.01); H01L 29/66795 (2013.01);
Abstract
An etching composition may include a peracetic acid mixture, a fluorine compound, an organic solvent (e.g., acetate-series organic solvent), and water. The etching composition may be used to selectively etch silicon-germanium (SiGe).