The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2019

Filed:

Mar. 24, 2015
Applicant:

Zeon Corporation, Tokyo, JP;

Inventors:

Tomonori Nakashima, Tokyo, JP;

Hiroyasu Nagamori, Tokyo, JP;

Sayaka Inoue, Tokyo, JP;

Assignee:

ZEON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 15/00 (2006.01); B29C 41/14 (2006.01); C08C 19/02 (2006.01); C08J 5/02 (2006.01); A61B 42/10 (2016.01); A41D 19/00 (2006.01); B29C 41/00 (2006.01); C08L 9/04 (2006.01); C08L 13/02 (2006.01); B29K 19/00 (2006.01); B29K 105/00 (2006.01); B29L 31/48 (2006.01);
U.S. Cl.
CPC ...
C08L 15/005 (2013.01); A41D 19/0082 (2013.01); A61B 42/10 (2016.02); B29C 41/003 (2013.01); B29C 41/14 (2013.01); C08C 19/02 (2013.01); C08J 5/02 (2013.01); C08L 9/04 (2013.01); C08L 13/02 (2013.01); C08L 15/00 (2013.01); B29K 2019/00 (2013.01); B29K 2105/0064 (2013.01); B29L 2031/4864 (2013.01); C08J 2309/04 (2013.01);
Abstract

A dip-molding composition of the present invention contains a latex (A) of a nitrile-group-containing highly saturated copolymer rubber (a). The nitrile-group-containing highly saturated copolymer rubber (a) contains an α,β-ethylenically unsaturated nitrile monomer unit and a conjugated diene monomer unit, and being obtained by hydrogenating at least part of the conjugated diene monomer unit. A dip-molded article of the present invention is produced by dip molding of the above dip-molding composition.


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