IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10414850 B1

PDFFull Text
Date of Patent:
Sep. 17, 2019

Filed:

Nov. 17, 2016

Resin containing phenolic hydroxyl groups, and resist film

Applicant:

Dic Corporation, Tokyo, JP;

Inventors:

Tomoyuki Imada, Ichihara, JP;

Yusuke Sato, Ichihara, JP;

Assignee:

DIC Corporation, Tokyo, JP;

Attorney:

Locke Lord LLP

Primary Examiner:

Christopher M Rodd

Int. Cl.
CPC ...
C08G 8/30 (2006.01); G03F 7/039 (2006.01); C08G 8/20 (2006.01); C08L 61/12 (2006.01); G03F 7/023 (2006.01); C08G 8/04 (2006.01);
U.S. Cl.
CPC ...
C08G 8/30 (2013.01); C08G 8/20 (2013.01); C08L 61/12 (2013.01); G03F 7/0236 (2013.01); G03F 7/039 (2013.01); C08G 8/04 (2013.01);
Abstract

Provided are a resin containing phenolic hydroxyl groups having excellent developability, heat resistance, and substrate followability, a photosensitive composition, a curable composition, and a resist film which contain the resin containing phenolic hydroxyl group. The resin containing phenolic hydroxyl groups obtained by reacting a novolac resin intermediate obtained by reacting a triarylmethane compound (A) with an aldehyde compound (B) as essential components, with an alkene compound (C) having 9 to 24 carbon atoms, a photosensitive composition, a curable composition, and a resist film which contain the resin containing phenolic hydroxyl groups.

Find Patent Forward Citations

Loading…