The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2019

Filed:

May. 19, 2017
Applicant:

Illinois Tool Works Inc., Glenview, IL (US);

Inventors:

Bradley Scott Withers, El Dorado Hills, CA (US);

Corey Alan Hughes, Sacramento, CA (US);

Erik Scott Nelson, Granite Bay, CA (US);

Steven Kenneth Christie, Placerville, CA (US);

Brent Allan Best, Rocklin, CA (US);

Assignee:

Illinois Tool Works Inc., Glenview, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 29/00 (2006.01); B24D 13/14 (2006.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); B24B 53/14 (2006.01); B24B 57/02 (2006.01);
U.S. Cl.
CPC ...
H01L 22/26 (2013.01); B24B 29/005 (2013.01); B24D 13/145 (2013.01); H01L 21/0201 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01); H01L 21/67253 (2013.01); H01L 21/67703 (2013.01); B24B 53/14 (2013.01); B24B 57/02 (2013.01);
Abstract

An example system for monitoring contamination level of effluent of an offline brush conditioning system includes a first reservoir configured to collect a first effluent from a first portion of a brush in the offline brush conditioning system and a second reservoir configured to collect a second effluent from a second portion of the brush, where the second portion is different from the first portion, and the first and second effluents are from a fluid used to condition a brush configured to clean a surface of a semiconductor wafer. An effluent contamination monitor is configured to monitor a first contamination level of the first effluent and a second contamination level of the second effluent.


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