The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2019

Filed:

Mar. 29, 2019
Applicant:

Newpowerplasma Co., Ltd., Pyoungtak-si, Gyeonggi-do, KR;

Inventors:

Seunghee Ryu, Gunpo-si, KR;

Youngchul Kim, Osan-si, KR;

Minjae Kim, Osan-si, KR;

Assignee:

NEWPOWERPLASMA CO., LTD., Pyoungtaek-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H03F 3/189 (2006.01); H03F 3/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32155 (2013.01); H01J 37/32183 (2013.01); H03F 3/189 (2013.01); H03F 3/20 (2013.01); H03F 2200/387 (2013.01); H03F 2200/451 (2013.01);
Abstract

A method for reducing reverse power reflected from a plasma load to a high frequency power amplifier includes determining a sign of a slope of an output frequency outputted from the high frequency power amplifier; determining a sign of a slope of reverse power reflected from the plasma load to the high frequency power amplifier; deciding an increase or a decrease in an amount of frequency change according to a combination of the sign of the slope of the output frequency and the sign of the slope of the reverse power; updating the output frequency by using the amount of the frequency change, and changing the output frequency in order to escape from a hump when a reflection coefficient is larger than a predetermined reflection reference value and the amount of the frequency change is smaller than a predetermined variation width setting value.


Find Patent Forward Citations

Ryu, Seunghee. (2019). Reverse power reducing method and plasma power apparatus using the same (U.S. Patent No. 10410834). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10410834

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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