The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
Mar. 25, 2016
Emc Corporation, Hopkinton, MA (US);
Jonas F. Dias, Rio de Janeiro, BR;
Diego Salomone Bruno, Niterói, BR;
André de Almeida Maximo, Rio de Janeiro, BR;
Adriana Bechara Prado, Rio de Janeiro, BR;
Vinícius Michel Gottin, Rio de Janeiro, BR;
Monica Barros, Rio de Janeiro, BR;
EMC Corporation, Hopkinton, MA (US);
Abstract
Methods and apparatus are provided for domain-tailored detection of outliers, patterns, and/or events in data streams. An exemplary method comprises obtaining a domain-dependent definition of (i) data outliers based on predefined outlier criteria; (ii) data patterns based on predefined pattern criteria; and/or (iii) data events based on predefined event criteria; obtaining time series measurement data from a plurality of sensors; determining, substantially simultaneously with the obtaining, whether individual samples satisfy the domain-dependent definitions of the data outliers, data patterns and/or data events; and storing the individual samples with an indication of whether the individual samples satisfy the domain-dependent definitions of the data outliers, data patterns and/or data events. The domain-dependent definitions are optionally specified using a declarative command language. Query are optionally processed comprising one or more declarative statements that reference and/or manipulate the data outliers, data patterns and/or data events.