The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
Mar. 19, 2019
Applicant:
University of Houston System, Houston, TX (US);
Inventors:
P. Shiv Halasyamani, Houston, TX (US);
Hongwei Yu, Houston, TX (US);
Assignee:
UNIVERSITY OF HOUSTON SYSTEM, Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/355 (2006.01); G02F 1/37 (2006.01); G02F 1/35 (2006.01); C30B 29/10 (2006.01); C30B 17/00 (2006.01); C30B 1/00 (2006.01); H01S 5/00 (2006.01);
U.S. Cl.
CPC ...
G02F 1/3551 (2013.01); C30B 1/00 (2013.01); C30B 17/00 (2013.01); C30B 29/10 (2013.01); G02F 1/35 (2013.01); G02F 1/37 (2013.01); H01S 5/0092 (2013.01);
Abstract
Disclosed is a nonlinear optical (NLO) material for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula ABCand a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula BaZnBPO.