The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
Jun. 30, 2017
Applicant:
Optalysys Ltd., Pontefract, West Yorkshire, GB;
Inventors:
Nicholas James New, Wakefield, GB;
Robert Todd, Wakefield, GB;
Assignee:
Optalysys Ltd., Wakefield, GB;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G02B 27/42 (2006.01); G02B 27/62 (2006.01); G01B 11/27 (2006.01);
U.S. Cl.
CPC ...
G02B 27/4255 (2013.01); G01B 11/27 (2013.01); G02B 27/4233 (2013.01); G02B 27/4272 (2013.01); G02B 27/62 (2013.01);
Abstract
A method for assessing the relative alignment of a first and second diffractive element. The method includes illuminating the first diffractive element to form a first diffraction pattern in the far field and illuminating the second diffractive element to form a second diffraction pattern in the far field. The method further comprises determining a positional and/or rotational relationship between the first diffraction pattern and the second diffraction pattern in the far field.