The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
Mar. 22, 2018
Applicant:
Flir Systems, Inc., Wilsonville, OR (US);
Inventors:
David Ovrutsky, Charlotte, NC (US);
Jeremy Huddleston, Oviedo, FL (US);
Paul Elliott, Charlotte, NC (US);
David Keller, Charlotte, NC (US);
Richard Jones, Charlotte, NC (US);
Thomas Mercier, Charlotte, NC (US);
Assignee:
FLIR SYSTEMS, INC., Wilsonville, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 13/14 (2006.01); G02B 3/00 (2006.01); H04N 5/33 (2006.01); H04N 5/225 (2006.01); G02B 13/22 (2006.01);
U.S. Cl.
CPC ...
G02B 13/14 (2013.01); G02B 13/22 (2013.01); H04N 5/2257 (2013.01); H04N 5/33 (2013.01);
Abstract
A method of manufacturing lenses includes creating a wafer-level master, overmolding the wafer-level master to form a daughter replica, casting a polymer lens shapes onto a wafer using the daughter replica, transferring the polymer lens shapes into the wafer, and singulating the wafer to create individual dies with a lens thereon. The wafer may be silicon, e.g., silicon having a resistivity between 0.1 and 100 Ωcm.