The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2019

Filed:

May. 17, 2017
Applicants:

Tsinghua University, Beijing, CN;

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Jiang-Tao Wang, Beijing, CN;

Xiang Jin, Beijing, CN;

Peng Liu, Beijing, CN;

Yang Wei, Beijing, CN;

Kai-Li Jiang, Beijing, CN;

Shou-Shan Fan, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 29/14 (2006.01); G01R 29/12 (2006.01); G01R 29/24 (2006.01); G01R 15/16 (2006.01); G01R 19/00 (2006.01); G01R 5/28 (2006.01); G01R 33/10 (2006.01);
U.S. Cl.
CPC ...
G01R 29/14 (2013.01); G01R 29/12 (2013.01); G01R 29/24 (2013.01); G01R 5/28 (2013.01); G01R 15/165 (2013.01); G01R 19/0023 (2013.01); G01R 33/10 (2013.01);
Abstract

The disclosure relates to a method for calculating surface electric field distribution of nanostructures. The method includes the following steps of: providing a nanostructure sample located on an insulated layer of a substrate; spraying first charged nanoparticles to the insulated surface; blowing vapor to the insulated surface and imaging the first charged nanoparticles via an optical microscope, recording the width w between the first charged nanoparticles and the nanostructure sample, and obtaining the voltage U of the nanostructure sample by an equation.


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