The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
Oct. 06, 2014
Applied Materials, Inc., Santa Clara, CA (US);
Anqing Cui, Palo Alto, CA (US);
Faruk Gungor, San Jose, CA (US);
Dien-Yeh Wu, San Jose, CA (US);
Vikas Jangra, Bangalore, IN;
Muhammad M. Rasheed, San Jose, CA (US);
Wei V. Tang, Santa Clara, CA (US);
Yixiong Yang, Santa Clara, CA (US);
Xiaoxiong Yuan, San Jose, CA (US);
Kyoung-Ho Bu, Pleasanton, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Yu Chang, San Jose, CA (US);
William W. Kuang, Sunnyvale, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods and apparatus for cleaning an atomic layer deposition chamber are provided herein. In some embodiments, a chamber lid assembly includes: a housing enclosing a central channel that extends along a central axis and has an upper portion and a lower portion; a lid plate coupled to the housing and having a contoured bottom surface that extends downwardly and outwardly from a central opening coupled to the lower portion of the central channel to a peripheral portion of the lid plate; a first heating element to heat the central channel; a second heating element to heat the bottom surface of the lid plate; a remote plasma source fluidly coupled to the central channel; and an isolation collar coupled between the remote plasma source and the housing, wherein the isolation collar has an inner channel extending through the isolation collar to fluidly couple the remote plasma source and the central channel.