The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Feb. 28, 2018
Applicant:

Postech Academy-industry Foundation, Pohang-si, KR;

Inventors:

Sungjune Jung, Pohang-si, KR;

Jimin Kwon, Paju-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 51/05 (2006.01); H01L 27/28 (2006.01); H01L 51/00 (2006.01); H03K 19/0948 (2006.01); H03K 19/20 (2006.01); H03K 19/21 (2006.01); H01L 27/12 (2006.01); H01L 27/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78648 (2013.01); H01L 27/124 (2013.01); H01L 27/1225 (2013.01); H01L 27/281 (2013.01); H01L 29/7869 (2013.01); H01L 51/0035 (2013.01); H01L 51/052 (2013.01); H01L 51/0554 (2013.01); H01L 51/0558 (2013.01); H03K 19/0948 (2013.01); H03K 19/20 (2013.01); H03K 19/215 (2013.01); H01L 27/0688 (2013.01);
Abstract

Disclosed is a logic circuit using three-dimensionally stacked dual-gate thin-film transistors, including a substrate, a first dual-gate thin-film transistor on the substrate, a second dual-gate thin-film transistor on the first dual-gate thin-film transistor, and a third dual-gate thin-film transistor on the second dual-gate thin-film transistor, wherein the first dual-gate thin-film transistor, the second dual-gate thin-film transistor and the third dual-gate thin-film transistor are electrically connected to each other. The logic circuit of the invention is configured such that dual-gate thin-film transistors are three-dimensionally stacked, whereby the advantages of the dual-gate structure and of thin-film transistors can be exhibited together and the degree of integration can be drastically increased, and a logic gate is made in the area of a single transistor, thereby remarkably simplifying wire and circuit designs.


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