The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Mar. 08, 2018
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventors:

Fumiki Aiso, Kuwana, JP;

Ryota Fujitsuka, Yokkaichi, JP;

Kensei Takahashi, Kuwana, JP;

Takayuki Matsui, Kuwana, JP;

Tomohisa Iino, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/673 (2006.01); H01L 21/687 (2006.01); H01L 21/677 (2006.01); B25J 11/00 (2006.01); B25J 15/00 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67745 (2013.01); B25J 11/0095 (2013.01); B25J 15/0014 (2013.01); H01L 21/67017 (2013.01); H01L 21/67303 (2013.01); H01L 21/67309 (2013.01); H01L 21/67313 (2013.01); H01L 21/67748 (2013.01); H01L 21/68707 (2013.01); C23C 16/44 (2013.01);
Abstract

In one embodiment, a semiconductor manufacturing apparatus includes a container to contain wafers, and supporting tables provided in the container so as to be stacked on one another, and each including a supporting face that comes into contact with a wafer to support the wafer. The apparatus further includes supporting columns to join the supporting tables together and provided at positions where the supporting columns are contained inside outer circumferences of the supporting tables. The apparatus further includes a gas feeder to feed a gas to the wafers on the supporting tables, and a gas discharger to discharge the gas fed to the wafers on the supporting tables. Each of the supporting tables includes a first upper face as the supporting face, and a second upper face provided so as to surround the first upper face at a level higher than a level of the first upper face.


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