The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
Dec. 27, 2017
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Atsushi Mizutani, Shizuoka, JP;
Tadashi Inaba, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 3/08 (2006.01); C08K 3/16 (2006.01); C08K 5/17 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0206 (2013.01); B08B 3/08 (2013.01); B81C 1/00952 (2013.01); C08K 3/16 (2013.01); C08K 5/17 (2013.01); H01L 21/02057 (2013.01); H01L 21/02071 (2013.01); B81B 2203/0361 (2013.01); B81B 2207/056 (2013.01);
Abstract
Provided are a method for treating a pattern structure which is capable of inhibiting collapse of a pattern structure, a method for manufacturing an electronic device including such a treatment method, and a treatment liquid for inhibiting collapse of a pattern structure. The method for treating a pattern structure includes applying a treatment liquid containing a fluorine-based polymer having a repeating unit containing a fluorine atom to a pattern structure formed of an inorganic material.