The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
Nov. 06, 2017
Applicant:
H.c. Starck Inc., Newton, MA (US);
Inventors:
Gary Alan Rozak, Akron, OH (US);
Mark E. Gaydos, Nashua, NH (US);
Patrick Alan Hogan, Somerville, MA (US);
Shuwei Sun, Framingham, MA (US);
Assignee:
H.C. STARCK INC., Newton, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 27/04 (2006.01); H01J 37/34 (2006.01); C23C 14/58 (2006.01); C23C 14/54 (2006.01); C23C 14/35 (2006.01); C23C 14/34 (2006.01); G06F 3/044 (2006.01); C03C 17/40 (2006.01); C22C 1/04 (2006.01); C23G 1/10 (2006.01); C23G 1/20 (2006.01); C23C 14/16 (2006.01); C23C 14/06 (2006.01); C23C 14/14 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3429 (2013.01); C03C 17/40 (2013.01); C22C 1/045 (2013.01); C22C 27/04 (2013.01); C23C 14/34 (2013.01); C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); C23C 14/3492 (2013.01); C23C 14/35 (2013.01); C23C 14/548 (2013.01); C23C 14/5873 (2013.01); C23G 1/106 (2013.01); C23G 1/205 (2013.01); G06F 3/044 (2013.01); B22F 2998/10 (2013.01); C23C 14/0688 (2013.01); C23C 14/14 (2013.01); C23C 14/16 (2013.01); G06F 2203/04103 (2013.01); Y10T 428/12014 (2015.01); Y10T 428/12021 (2015.01); Y10T 428/12597 (2015.01); Y10T 428/31678 (2015.04);
Abstract
The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of titanium, and a third metal element of chromium or tantalum, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in titanium, and a phase that is rich in the third metal element.