The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Sep. 29, 2014
Applicant:

Yoshihiro Tawara, Hokuto, JP;

Inventor:

Yoshihiro Tawara, Hokuto, JP;

Assignee:

HOYA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/84 (2006.01); C09G 1/02 (2006.01); C09G 1/16 (2006.01);
U.S. Cl.
CPC ...
G11B 5/8404 (2013.01); C09G 1/02 (2013.01); C09G 1/16 (2013.01);
Abstract

A method for manufacturing a glass substrate according to which surface roughnesses of main surfaces of a glass substrate can be reduced more than with currently available methods is provided. After the main surfaces of the glass substrate used in a magnetic disk are mirror-polished (final finishing-polished) using a polishing liquid containing organic-based particles made of, for example, a styrene-based resin, an acrylic resin, or a urethane-based resin as polishing abrasive particles, by cleaning the glass substrate using an organic-based cleaning agent, surface roughnesses of the main surfaces of the substrate can be reduced more than with currently available methods.


Find Patent Forward Citations

Loading…