The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
Mar. 02, 2016
M and M Technologies Limited, Central, HK;
Tin Hong Alexander Tang, Hong Kong, HK;
Roger Arthur Zwahlen, Hong Kong, HK;
Yasas Sri Nalaka Jayaratne, Farmington, CT (US);
M and M Technologies Limited, Central, HK;
Abstract
A method of facial recognition has been developed by the application of a statistical method, standard deviations or standard errors versus sample number plots, to differentiate the degree of reproducibilities of various measurements between facial anthropological landmarks in individual ethnic groups. Reproducible measurements between facial anthropological landmarks in a particular ethnic group mean they are common features shared by individuals of that ethnic group. Non-reproducible measurements are unique features of each individual in that ethnic group which may be used for individual facial recognition purposes. Such methodology may be computerized for automatic facial recognition. A large amount of data of each ethnic group is needed for facial recognition. In turn, the development of databases of each ethnic group will result in a large amount of data of human faces.