The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
Dec. 28, 2018
Canon Kabushiki Kaisha, Tokyo, JP;
Hikaru Sugita, Utsunomiya, JP;
Masato Homma, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An exposure apparatus that exposes a substrate W has a rectifying mechanismthat supplies a gas so as to traverse the optical axis of a projection optical system, in a space between the projection optical systemand the substrate W that face each other, the flow rectifying mechanismsupplies a gas so as to have a flow rate distribution in which a flow rate at a second position that is located farther from the projection optical systemthan a first position is higher than a flow rate at the first position, and the rectifying mechanismincludes a first rectifying mechanismthat forms a flow rate distribution by dividing a flow path of the gas into a first flow path of a gas flowing to a first position and a second flow path of a gas flowing to a second position.