The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Apr. 06, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Viachslav Babayan, Sunnyvale, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Kyle M. Hanson, Kalispell, MT (US);

Robert B. Moore, Bigfork, MT (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/38 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70716 (2013.01); G03F 7/38 (2013.01); G03F 7/70725 (2013.01); H01L 21/6719 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/67109 (2013.01); H01L 21/67126 (2013.01); H01L 21/67167 (2013.01); H01L 21/67178 (2013.01); H01L 21/67248 (2013.01);
Abstract

Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.


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