The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
Aug. 02, 2016
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Tetsushi Ishikawa, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2024 (2013.01); B41J 2/1601 (2013.01); B41J 2/1603 (2013.01); B41J 2/1631 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract
A method for producing a microstructure provided with a member in which, on a substrate having a plurality of concave shapes processed thereon, a dry film resist is subjected to tenting on open faces of a plurality of concave shapes, and then openings are formed in the dry film resist where divided exposure is performed such that patterning is performed with first exposure light and second exposure is performed to cause overexposure.