The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Oct. 03, 2017
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Sungman Kim, Seoul, KR;

Junho Song, Seongnam-si, KR;

Hanjun Yu, Seoul, KR;

Seon Uk Lee, Seongnam-si, KR;

Seongsu Lim, Seoul, KR;

Tae Hyung Hwang, Seoul, KR;

Assignee:

Samsung Display Co., Ltd., Youngin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G03F 7/00 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133528 (2013.01); G02F 1/133536 (2013.01); G03F 7/0002 (2013.01); G03F 7/0007 (2013.01); G03F 7/0035 (2013.01); G03F 7/16 (2013.01); G02F 2001/133548 (2013.01); G02F 2001/133565 (2013.01);
Abstract

A method of manufacturing a wire grid polarizer for a display apparatus includes the steps of forming a first layer on a base substrate including an active area and a peripheral area surrounding the active area, forming a hard mask layer on the first layer, coating an imprint resin on the hard mask layer, forming an imprint resin pattern by imprinting a stamp on the imprint resin, wherein the stamp is larger than the base substrate, forming a hard mask pattern by patterning the hard mask layer using the imprint resin pattern, forming a wire grid pattern layer by pattering the first layer using the hard mask pattern, forming a photoresist pattern in the active area on the base substrate, removing the hard mask pattern and the wire grid pattern layer in the peripheral area using the photoresist pattern, and forming a capping layer on the wire grid pattern.


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