The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Jun. 13, 2014
Applicant:

Essilor International (Compagnie Generale D'optique), Charenton-le-Pont, FR;

Inventors:

Sebastien Chiarotto, Charenton-le-Pont, FR;

Bruce Faure, Charenton-le-Pont, FR;

Stephanie Pega, Charenton-le-Pont, FR;

Karin Scherer, Charenton-le-Pont, FR;

Assignee:

Essilor International, Charenton-le-Pont, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/18 (2015.01); G02B 1/115 (2015.01); C03C 17/00 (2006.01); C03C 17/42 (2006.01); G02B 1/10 (2015.01); G02B 1/111 (2015.01); G02C 7/02 (2006.01);
U.S. Cl.
CPC ...
G02B 1/18 (2015.01); C03C 17/001 (2013.01); C03C 17/009 (2013.01); C03C 17/42 (2013.01); G02B 1/105 (2013.01); G02B 1/111 (2013.01); G02B 1/115 (2013.01); G02C 7/022 (2013.01); C03C 2217/734 (2013.01); C03C 2217/76 (2013.01); C03C 2217/948 (2013.01); G02C 2202/16 (2013.01);
Abstract

The invention concerns an item comprising a substrate having at least one main surface coated with a layer A in direct contact with a hydrophobic outer layer B, characterized in that said layer A has been obtained by depositing, under ion beam, activated species from at least one compound C, in gas form, containing, in the structure of same: at least one carbon atom, at least one hydrogen atom, at least one Si—X group, in which X is a hydroxy group or a hydrolysable group chosen from the H, halogen, alkoxy, aryloxy and acyloxy groups, —NRRin which Rand Rseparately designate a hydrogen atom, an alkyl group or an aryl group, and —N(R)—Si in which Rdesignates an alkyl group or an aryl group, said compound C being neither tetramethyldisiloxane nor tetraethoxysilane, nor vinylmethyldiethoxysilane, nor hexamethylcyclotrisilazane, said layer A not being formed from inorganic precursor compounds.


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