The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Aug. 29, 2018
Applicant:

Mark J. Hagmann, Salt Lake City, UT (US);

Inventor:

Mark J. Hagmann, Salt Lake City, UT (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 60/16 (2010.01); G01Q 30/20 (2010.01); G01Q 60/14 (2010.01); G01Q 60/12 (2010.01);
U.S. Cl.
CPC ...
G01Q 60/16 (2013.01); G01Q 30/20 (2013.01); G01Q 60/12 (2013.01); G01Q 60/14 (2013.01);
Abstract

In order to meet the needs of the semi-conductor industry as it requires finer lithography nodes, a method of feedback control for scanning probe microscopy generates a microwave frequency comb of harmonics in a tunneling junction by irradiating the junction with mode-locked pulses of electromagnetic radiation. Utilizing power measurements within one or more harmonics, the tip-sample distance in the tunneling junction may be regulated for maximum efficiency and avoid tip crash when used with resistive samples. Optionally, no DC bias is required to use the method. Utilization of this method contributes to true sub-nanometer resolution of images of carrier distribution in resistive samples such as semi-conductors.


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