The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
Mar. 24, 2014
Applicant:
Wacker Chemie Ag, Munich, DE;
Inventors:
Assignee:
WACKER CHEMIE AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B02C 23/08 (2006.01); C23C 16/24 (2006.01); C01B 33/035 (2006.01); C23C 16/01 (2006.01); G01N 29/09 (2006.01); C23C 16/56 (2006.01); H01L 31/028 (2006.01); H01L 31/0368 (2006.01);
U.S. Cl.
CPC ...
C23C 16/01 (2013.01); B02C 23/08 (2013.01); C01B 33/035 (2013.01); C23C 16/24 (2013.01); C23C 16/56 (2013.01); G01N 29/09 (2013.01); H01L 31/028 (2013.01); H01L 31/03682 (2013.01); G01N 2291/0234 (2013.01);
Abstract
Siemens reactors for polysilicon deposition may employ faster and/or more economical deposition conditions without reduction in yield, by pre-sorting polysilicon rods into different quality classifications prior to comminution, and further sorting the polysilicon fragments in each classification into further classifications.