The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
Oct. 12, 2017
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Ian Scot Latchford, Palo Alto, CA (US);
Mary Anne Plano, Mountain View, CA (US);
Assignee:
LAM RESEARCH CORPORATION, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); C23C 14/22 (2006.01); C23C 14/02 (2006.01); C23C 14/06 (2006.01); C23C 16/22 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 14/56 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
C23C 14/22 (2013.01); C23C 14/02 (2013.01); C23C 14/06 (2013.01); C23C 16/0209 (2013.01); C23C 16/22 (2013.01); C23C 16/4404 (2013.01); C23C 16/45565 (2013.01); C23C 14/56 (2013.01); C23C 16/46 (2013.01);
Abstract
A method for removing and preventing defects on surfaces of a component of a substrate processing chamber includes loading the component into a vacuum chamber and, with the component loaded within the vacuum chamber, baking the component at a baking temperature during a first predetermined period to remove water and defects from the surfaces of the component, and purging the component within the vacuum chamber during at least one second predetermined period to remove the defects from the vacuum chamber.