The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2019

Filed:

Dec. 12, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Nicolas Dupuis, New York, NY (US);

Benjamin Lee, Ridgefield, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/35 (2006.01); H04Q 11/00 (2006.01);
U.S. Cl.
CPC ...
H04Q 11/0005 (2013.01); G02B 6/356 (2013.01); G02B 6/3596 (2013.01);
Abstract

Techniques for using planar photonic switch fabrics with reduced waveguide crossings are described. In one embodiment, a system is provided that comprises a memory that stores computer-executable components and a processor that executes computer-executable components stored in the memory. In one implementation, the computer-executable components comprise an arrangement component that arranges a first planar switch fabric topology. The computer-executable components further comprise a transformation component that interleaves a plurality of inputs of the first planar switch fabric topology and a plurality of outputs of the first planar switch fabric topology to form a second planar switch fabric topology, the second planar switch fabric topology having a lower number of waveguide crossings than the first planar switch fabric topology.


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