The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2019

Filed:

May. 21, 2018
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventors:

Kazuo Sakamoto, Tokyo, JP;

Toshiaki Ito, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/092 (2006.01); H01L 21/8238 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0928 (2013.01); H01L 21/823807 (2013.01); H01L 21/823892 (2013.01); H01L 27/0259 (2013.01);
Abstract

According to one embodiment, a semiconductor device includes a shallow P-well, a shallow N-well, a shallow P-well, and a shallow N-well formed in regions different from one another, a deep N-well formed in a part deeper than the shallow P-well and the shallow N-well, and a base material, and further includes a first transistor formed in a part of the shallow P-well and the shallow N-well on the side of the principal surface, and a second transistor formed in a part of the shallow P-well and the shallow N-well on the side of the principal surface, in which the shallow N-well is formed in such a way as to surround the peripheral edge of the region of the shallow P-well.


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